Tipo
Atomic Layer Deposition
Saída de vídeo-inspeção
Fornecido
Relatório de Ensaio de máquinas
Fornecido
Componentes do núcleo
Bomba
Dimensão (L*W*H)
customization
Principais Pontos de Venda
O Preço do competidor
Product name
Thermal Atomic Layer Deposition System
Application
Microelectronics, nanomaterials, optical films, solar cells
Technology
Atomic Layer Deposition ALD
Sample table size
8 inch and below
Substrate heating temperature
RT-400℃; ±1 ℃
Number of precursors
3,optional more lines
Precursor source pipeline temperature
RT-200 ℃; ±1 ℃
Source container temperature
RT-200 ℃; ±1 ℃
Background vacuum
<5*10-3Torr
Growing mode
Consecutive or interval deposition mode
